Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• at rates comparable to conventional techniques such as laser-induced chemical vapor deposition. The deposition rate and stoichiometry of boron oxide fabricated by EBID using trimethyl borate (TMB) as precursor is found to be critically dependent on the substrate temperature. By comparing the

• process and the potential for EBID as a scalable fabrication technique that could have a transformative effect on the athermal deposition of materials. Keywords: boron oxide; diffusion and growth; electron beam-induced deposition; surface reactions; trimethyl borate; Introduction Applications for boron

• under controlled gaseous environments similar to those found in nanoscale EBID processing have not been realized. In this article, the deposition of boron-containing material through the EBID process is reported using trimethyl borate (TMB, B(CH3O)3) as precursor. TMB is an alkoxide-based molecule with